Low Resistance Ohmic Contacts to p-Ge C on Si
نویسندگان
چکیده
We report on ohmic contact measurements of Al, Au, and W metallizations to p-type epitaxial Ge0:9983C0:0017 grown on a (100) Si substrate by molecular beam epitaxy (MBE). Contacts were annealed at various temperatures, and values of specific contact resistance have been achieved which range from 10 5 cm2 to as low as 5:6 10 6 cm2. Theoretical calculations of the contact resistance of metals on Ge1 xCx with small percentages of carbon, based on the thermionic field emission mechanism of conduction, result in good agreement with the experimental data. We conclude that Al and Au are suitable ohmic contacts to p-Ge0:9983C0:0017 alloys.
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